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@Article{UedaBCBARBL:2002:RePr,
               author = "Ueda, Mario and Berni, Luis Angelo and Castro, R. M. and Beloto, 
                         Antonio Fernando and Abramof, Eduardo and Rossi, Jos{\'e} Oswaldo 
                         and Barroso, Joaquim Jose and Lepienski, C. M.",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais 
                         (INPE)} and {Universidade Federal de Paran{\'a}}",
                title = "Surface improvements of industrial components treated by plasma 
                         immersion ion implantation (PIII): results and prospects",
              journal = "Surface and Coatings Technology",
                 year = "2002",
               volume = "156",
               number = "1-3",
                pages = "71--76",
                month = "July",
             keywords = "plasma immersion ion implantation, surface analysis, 
                         nano-indentation, titanium alloy, fast steel, high resolution 
                         X-ray.",
             abstract = "The major drive for PIII research in recent years has been the 
                         widespread use of plasma-based ion implantation in industries 
                         aiming at attaining high value-added components. After achieving 
                         the domain of the complete basic PIII cycle, we started to pursue 
                         the implementation of this process in various types of industrial 
                         components. A DC glow discharge source with a controlled plasma 
                         floating potential was used in a 100-l PIII system driven by a 
                         30-kV peak voltage, 50 ms duration, up to 1.1 kHz pulse power 
                         source, in order to process the components which were provided by 
                         regional companies, spanning from machinery tools to prosthesis. 
                         The industrial components were set-up in the PIII chamber as 
                         received from the companies, after a simple cleaning procedure. In 
                         this phase, only nitrogen implantation was performed. The required 
                         processing times were typically from 60 to 120 min and the 
                         components were treated either individually or in batches. Fast 
                         steel drill bits, knife blades for wood cutting, tools for 
                         odontological applications, molds made of fast steel, a prosthesis 
                         made of Ti alloy, etc., have been three-dimensionally implanted 
                         successfully. Next, improvements in the PIII ongoing system 
                         included: a 10-kW pulser with up to 60 kV capability, turbo-pump, 
                         refrigerated walls, auxiliary heating of the components, a larger 
                         chamber and a magnetron sputtering source for hybrid treatments.",
           copyholder = "SID/SCD",
                 issn = "0257-8972",
             language = "en",
           targetfile = "64.pdf",
        urlaccessdate = "18 jan. 2021"
}


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