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		<issn>0257-8972</issn>
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		<citationkey>UedaSilLepGonReu:2007:HiTePl</citationkey>
		<author>Ueda, Mário,</author>
		<author>Silva, M. M.,</author>
		<author>Lepienski, C. M.,</author>
		<author>Gonçalves, José Américo Neves,</author>
		<author>Reuther, H.,</author>
		<group>LAP-INPE-MCT-BR</group>
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		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<affiliation>Department of Mechanical Engineering, Technological Institute of Aeronautics</affiliation>
		<affiliation>Departamento de Física. Universidade Federal do Paraná (UFPR)</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<affiliation>Institute of Ion Beam Physics and Materials Research</affiliation>
		<title>High temperature plasma immersion ion implantation of Ti6Al4V</title>
		<journal>Surface and Coatings Technology</journal>
		<year>2007</year>
		<volume>201</volume>
		<number>9/11</number>
		<month>Feb.</month>
		<keywords>plasma immersion ion implantation, materials.</keywords>
		<abstract>We have performed high temperature nitrogen plasma immersion ion implantation (PIII) of Ti6Al4V by heating the samples for up to 800 degrees C, using tungsten filaments inside the sample holder. Ion implantation was done with the high voltage pulser at 5 kV, 40 lts duration and 400 Hz frequency, and a nitrogen glow discharge as the plasma source. Nanoindentation analysis of the treated surface indicated an improvement of 5 times in hardness for PIII treatment of 120 min. X-ray diffraction indicated the formation of Ti2N. Auger Electron Spectroscopy (AES) showed that the peak concentration is greater than 30% in the implanted nitrogen with the maximum penetration of 150 nm for the sample treated during 120 min.</abstract>
		<pages>4953-4956</pages>
		<language>en</language>
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