author = "Ueda, M{\'a}rio and Silva Junior, Ataide Ribeiro da and Mitma 
                         Pillaca, Elver Juan de Dios and Mariano, Samantha de F{\'a}tima 
                         Magalh{\~a}es and Rossi, Jos{\'e} Osvaldo and Oliveira, 
                         Rog{\'e}rio de Moraes and Pichon, L. and Reuther, H.",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais 
                         (INPE)} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and 
                         {CNRS-Universit{\'e} de Poitiers-ENSMA} and {Helmholtz-Zentrum 
                title = "New possibilities of plasma immersion ion implantation (PIII) and 
                         deposition (PIII\&D) in industrial components using metal tube 
              journal = "Surface and Coatings Technology",
                 year = "2017",
               volume = "312",
                pages = "37--46",
                month = "Feb.",
             keywords = "Batch processing, Hollow cathode plasma, Industrial components, 
                         Metal tube fixture, Plasma immersion ion implantation, Plasma 
                         immersion ion implantation and deposition.",
             abstract = "New possibilities of Plasma Immersion Ion Implantation (PIII) and 
                         deposition (PIII\&D) for treating industrial components in the 
                         batch mode have been explored. A metal tubular fixture is used to 
                         allocate the components inside around and along the tube, exposing 
                         to the plasma only the parts of each component that will be 
                         implanted. Hollow cathode- like plasma is generated only inside 
                         the tube filled with the desired gas, by applying high negative 
                         voltage pulses to the hollow cylindrical metal fixture which is 
                         insulated from the vacuum chamber walls. The metal tube (Me-tube) 
                         loaded with workpieces can be set-up inside the vacuum chamber in 
                         the standing-up, upside down or lying down arrangements. PIII 
                         tests were also run with and without metal sheet lids on the tube 
                         as well as with and without the components. Sputtering deposition 
                         and carbonitriding are also possible in this scheme by placing 
                         carbon tapes inside the tube and running the process with nitrogen 
                         PIII. Relatively clean DLC (Diamond Like Carbon) PIII\&D 
                         deposition is possible by this method also since the plasma 
                         occupies mainly the Me-tube interior and not the whole chamber. 
                         Furthermore, operating high density PIII and PIII\&D systems 
                         without additional plasma source, using only the high voltage 
                         pulser, is now possible to treat three dimensional parts. These 
                         methods are very convenient for batch processing of industrial 
                         parts by ion implantation and by ion implantation and deposition, 
                         in which a large number of small to medium size components can be 
                         treated by PIII and PIII\&D, very quickly, efficiently and also 
                         at low cost.",
                  doi = "10.1016/j.surfcoat.2016.08.067",
                  url = "http://dx.doi.org/10.1016/j.surfcoat.2016.08.067",
                 issn = "0257-8972",
             language = "en",
           targetfile = "ueda_new.pdf",
        urlaccessdate = "17 abr. 2021"