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@InProceedings{MitmaPillacaTravRami:2019:DeDiCa,
               author = "Mitma Pillaca, Elver Juan de Dios and Trava-Airoldi, Vladimir 
                         Jesus and Ramirez, M.",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Universidade do Vale 
                         do Para{\'{\i}}ba (UNIVAP)}",
                title = "Deposition of diamond-like carbon films on interior surface of a 
                         metallic tube with high aspect ratio",
                 year = "2019",
         organization = "International Conference on Metallurgical Coatings and Thin Films 
                         (ICMCTF), 46.",
             abstract = "Recently, we have studied the growth of DLC film on the inner 
                         surface of a stainless steel AISI 304 tube with high aspect ratio 
                         (length/diameter = 20) by using the Plasma Enhanced Chemical Vapor 
                         Deposition (PECVD) technique. In this configuration, a tube with 
                         200 cm in length and 10 cm in diameter was used as a reator. The 
                         inlet and the pumping of the gas is performed by both side of the 
                         tube-ends. Thus, in the present work are reports the results about 
                         the effect of the pulse width on the plasma discharge and on the 
                         adherence of DLC film. The coating was performed by using the 
                         pulsed-DC PECVD technique and the acetylene gas, as precursor. 
                         Five samples of AISI 304 were distributed longitudinally on the 
                         tube inner for the film growth and subsequent characterization. 
                         The system was pumped down to a base pressure of 10-4 Torr by a 
                         set of mechanical and diffusion pump. The working pressure was 
                         kept constant at aproximately 3 mTorr in all the experiments. The 
                         voltage was kept at 1 kV (SiH4 plasma) and at 0.7 kV (Ar and C2H2 
                         plasma). The repetition rate was 21 kHz whereas the pulse width 
                         was varied from 5 to 20 Ás. Various results were obtained: (a) 
                         high voltages can be applied by using lower pulse width; (b) the 
                         confinament of the plasma is affected; (c) the temperature on the 
                         tube surface was reduced significantly during the plasma 
                         discharge; (d) amorphous carbon hydrogenated (a-C:H) films with a 
                         remarkable improvement on the adherence of the DLC film were 
                         obtained. Results of Raman scattering spectroscopy have shown 
                         dependence of structure and quality of the DLC film with the 
                         longitudinal distribution.",
  conference-location = "San Diego, CA",
      conference-year = "19-24 May",
             language = "en",
        urlaccessdate = "29 nov. 2020"
}


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