@Article{ZiminAmGoNaAbRa:2016:PlSpPb,
author = "Zimin, S. P. and Amirov, I. I. and Gorlachev, E. S. and Naumov, V.
V. and Abramof, Eduardo and Rappl, Paulo Henrique de Oliveira",
affiliation = "{Demidov State University} and {Russian Academy of Sciences} and
{Russian Academy of Sciences} and {Russian Academy of Sciences}
and {Instituto Nacional de Pesquisas Espaciais (INPE)} and
{Instituto Nacional de Pesquisas Espaciais (INPE)}",
title = "Plasma sputtering of Pb1–x Eu x Te films with varied composition
and structure",
journal = "Journal of Surface Investigation: X-ray, Synchroton and Neutron
Techniques",
year = "2016",
volume = "10",
number = "3",
pages = "623--626",
month = "May",
keywords = "lead chalcogenides, molecular-beam epitaxy, films, high-frequency
inductively coupled argon plasma, plasma surface treatment.",
abstract = "We investigate the sputtering of single-crystal and
polycrystalline films of Pb1x Eu x Te (x = 0.020.10) in
high-frequency inductively coupled argon plasma. Layers of Pb1x Eu
x Te are grown via molecular beam epitaxy on barium-fluoride
substrates of the (111) orientation at 340 and 200°C. For
single-crystal films, the dependence of the sputtering rate on the
europium concentration is found. For polycrystalline layers, a
decrease in the sputtering rate is observed. This is caused by the
effect of europium oxidation at the surface of the
polycrystallites.",
doi = "10.1134/S102745101603037X",
url = "http://dx.doi.org/10.1134/S102745101603037X",
issn = "1027-4510",
language = "en",
urlaccessdate = "04 jun. 2024"
}