@Article{BarrosRiAnJuSeFe:2005:HiPrCh,
               author = "Barros, Rita de C{\'a}ssia Mendes de and Ribeiro, Mauro Celso and 
                         An-Sumodjo, Paulo Teng and Juli{\~a}o, Murilo S{\'e}rgio da 
                         Silva and Serrano, S{\'{\i}}lvia Helena Pires and Ferreira, 
                         Neiden{\^e}i Gomes",
          affiliation = "Instituto de Qu{\'{\i}}mica, Universidade de S{\~a}o Paulo and 
                         Instituto de Qu{\'{\i}}mica, Universidade de S{\~a}o Paulo and 
                         Instituto de Qu{\'{\i}}mica, Universidade de S{\~a}o Paulo and 
                         Instituto de Qu{\'{\i}}mica, Universidade de S{\~a}o Paulo and 
                         Instituto de Qu{\'{\i}}mica, Universidade de S{\~a}o Paulo and 
                         {Instituto Nacional de Pesquisas Espaciais (INPE)}",
                title = "Filmes de diamante CVD dopados com boro. Parte I. Hist{\'o}rico, 
                         produ{\c{c}}{\~a}o e caracteriza{\c{c}}{\~a}o / Boron-doped 
                         CVD diamond films. Part I. History, production and 
                         characterization",
              journal = "Qu{\'{\i}}mica Nova",
                 year = "2005",
               volume = "28",
               number = "2",
                pages = "317--325",
             keywords = "CVD boron-doped diamond growth, diamond electrodes, 
                         electrochemistry.",
             abstract = "This review presents a brief account concerning the production, 
                         characterization and evolution of the knowledge in the area of 
                         diamond and boron-doped diamond films. The most important methods 
                         used for the growth of these films, such as chemical vapor 
                         deposition and high pressure/high temperature systems, as well as 
                         the several kinds of reactors which can be employed are reviewed. 
                         However, larger emphasis is given to the CVD method. 
                         Morphological, structural and electric properties of these films, 
                         as well as their role in the performance of voltammetric 
                         electrodes for electrochemistry and electroanalytical chemistry 
                         are also discussed.",
                 issn = "0100-4042",
             language = "pt",
           targetfile = "23655.pdf",
        urlaccessdate = "29 jun. 2024"
}