@Article{GonçalvesSandIha:2003:ElEmMe,
author = "Gon{\c{c}}alves, Jos{\'e} Am{\'e}rico Neves and Sandonato,
Gilberto Marrega and Iha, K.",
affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)} and Instituto
Tecnol{\'o}gico de Aeron{\'a}utica, Departamento de
Qu{\'{\i}}mica, S{\~a}o Jos{\'e} dos Campos, SP, Brasil",
title = "Electron-field emission measurements from boron-doped CVD diamond
on tantalum",
journal = "Brazilian Journal of Physics",
year = "2003",
volume = "33",
number = "1",
pages = "94--97",
month = "Mar.",
keywords = "tecnologia de plasma, plasma technology, films, surface.",
abstract = "Boron-doped polycrystaline diamond films grown by
hot-filament-assisted chemical vapor deposition were studied with
ultraviolet photoemission spectroscopy (UPS), Raman spectroscopy,
X-ray diffractometry and current voltage measurements. The UPS
measurement shows that the work function (0) without electric
field is about 3.9 W. The field-emission current-voltage
measurements indicate a threshold voltage ranging from 8.97x10^(6)
to 9.64x10^(6) V/m and a work function (phi) about.0.3 eV. These
results show that boron doped diamond films exhibit a negative
electron affinity in high electric field.",
copyholder = "SID/SCD",
doi = "10.1590/S0103-97332003000100006",
url = "http://dx.doi.org/10.1590/S0103-97332003000100006",
issn = "0103-9733",
language = "en",
targetfile = "a06v33n1.pdf",
url = "http://dx.doi.org/10.1590/S0103-97332003000100006",
urlaccessdate = "29 jun. 2024"
}