@Article{CoutoBaldFerr:2012:CoPhOn,
               author = "Couto, A. B. and Baldan, M. R. and Ferreira, N. G.",
          affiliation = "{} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and 
                         {Instituto Nacional de Pesquisas Espaciais (INPE)}",
                title = "Copper photoelectrodeposition onto boron doped micro and 
                         ultra-nanocrystalline diamond electrodes applied to nitrate 
                         electroreduction",
              journal = "ECS Transactions",
                 year = "2012",
               volume = "43",
               number = "1",
                pages = "177--183",
                 note = "18 Simposio Brasileiro de Eletroquimica e Eletroanalitica, SIBEE 
                         ISSN: 19385862, E-ISSN: 19386737; ISBN-13: 9781607683384; DOI: 
                         10.1149/1.4704955, 28 Aug. - 1 Sep., 2011; Publisher: 
                         Electrochemical Society Inc.",
             keywords = "Copper deposits, Deposits, Electrolytic reduction, Nitrates, 
                         Voltage regulators.",
             abstract = "The influence of the boron doped micro and ultra-nanocrystalline 
                         diamond (BDD and BDUND) morphologies in the copper 
                         photoelectrodeposition was investigated. Copper particles were 
                         deposited in the potentiostat mode and under UV irradiation for 
                         both electrodes. For BDD, the copper deposits presented high 
                         density and uniformity all over the crystal faces. This behavior 
                         may be explained by its semiconductor character that promoted 
                         additional photogenerated electrons enhancing the copper reduction 
                         reaction. Otherwise, for BDUND the copper particles were randomly 
                         located with low density. Concerning the nitrate reduction 
                         process, Cu/BDD presented a better response and reproducibility 
                         compared to those for the Cu/BDUND electrode.",
                 issn = "1938-5862",
                label = "self-archiving-INPE-MCTIC-GOV-BR",
             language = "en",
        urlaccessdate = "29 jun. 2024"
}