@InProceedings{BarqueteCoraMour:2004:CVFiWC,
author = "Barquete, Danilo Maciel and Corat, Evaldo Jos{\'e} and Moura
Neto, Carlos de",
title = "CVD-Diamand Films on WC-Co with vanadium carbide thermal diffusion
layer",
booktitle = "Proceedings...",
year = "2004",
organization = "Congresso e Exposi{\c{c}}{\~a}o Internacionais de Tecnologia da
Mobilidade, 13.",
keywords = "Manufacturing processes.",
abstract = "CVD diamond film deposition on WC-Co substrate is the most likely
application of diamond CVD technology towards large scale
production, due to its suitability to aluminium alloys machining
in the automotive and aerospace industry. Several film-substrate
interfaces and surface modifications have been developed aiming
higher levels of simultaneous diamond film-substrate adherence and
substrate surface toughness, however the results are still far
bellow industry requirements for widen scale application. In this
work a new interface is introduced in the CVD diamond films
technology, which consists of a thermo-reactive deposited and
diffused vanadium carbide layer, highly adequate to diamond films
deposition on cemented carbide cutting and forming tools. This
interface presents good diamond growth characteristics, thermal
expansion coefficient similar to the substrate and, in addition,
high hardness and mechanical strength. Diamond films quality and
interface characteristics are evaluated by SEM images and linescan
technique, X ray diffraction and Raman spectroscopy. A typical
Raman shift of 4,1 cm \−1 is obtained observed,
corresponding to a compressive residual stresses of 1,4 GPa
applied from the substrate to the CVD diamond film through
vanadium carbide interface.",
conference-location = "S{\~a}o Paulo",
conference-year = "16-18 Nov.",
doi = "10.4271/2004-01-3295",
url = "http://dx.doi.org/10.4271/2004-01-3295",
label = "self-archiving-INPE-MCTIC-GOV-BR",
language = "en",
targetfile = "barquete_cvd.pdf",
urlaccessdate = "15 jun. 2024"
}