@Article{RodriguesPrioFrei:2006:EfGrCo,
author = "Rodrigues, Gil Capote and Prioli, R. and Freite J{\'u}nior, F.
L.",
affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and
Departamento de F{\'{\i}}sica, Pontif{\'{\i}}cia Universidade
Cat{\'o}lica do Rio de Janeiro (PUC-RJ) and Departamento de
F{\'{\i}}sica, Pontif{\'{\i}}cia Universidade Cat{\'o}lica do
Rio de Janeiro (PUC-RJ)",
title = "Effects of the growth conditions on the roughness of amorphous
hydrogenated carbon films deposited by plasma enhanced chemical
vapor deposition",
journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and
Films",
year = "2006",
volume = "26",
number = "6",
pages = "2212--2216",
month = "Nov./Dec.",
abstract = "The surface roughness and scaling behavior of a-C:H films
deposited by plasma enhanced chemical vapor deposition from CH4Ar
mixtures were studied using atomic force microscopy. Raman
spectroscopy gives some insights about the film microstructure.
The film surface roughness is shown to decrease with the increase
of deposition negative self-bias, while the presence of Ar ions
enhances this effect. An analysis of the film surface and scaling
behavior suggests that there is a transition of the mechanism of
the film growth from a random deposition with surface diffusion
process to a thermal spike based process that occurs upon the
increase of the negative self-bias voltage and the argon
bombardment.",
copyholder = "SID/SCD",
issn = "0734-2101",
language = "en",
targetfile = "Effects of growth conditions.pdf",
urlaccessdate = "02 maio 2024"
}