@MastersThesis{Costa:2007:CrCaEp,
author = "Costa, Romina Paula de Castro",
title = "Crescimento de camadas epitaxiais de CaF2 e BaF2 sobre substratos
de sil{\'{\i}}cio para posterior desenvolvimento de
heteroestruturas de PbTe e PbEute",
school = "Instituto Nacional de Pesquisas Espaciais (INPE)",
year = "2007",
address = "S{\~a}o Jos{\'e} dos Campos",
month = "2007-02-16",
keywords = "crescimento por MBE, interfaces CaF2, BaF2, Si, PbTe e PbEuTe,
crescimento por epitaxia de feixe molecular, interfaces de
fluoreto de c{\'a}lcio (CaF2) e fluoreto de B{\'a}rio (BaF2),
growth MBE, buffer CaF2, BaF2, Si, PbTe and PbEuTe, growth
molecular beam epitaxy, buffers fluorides calcium and barium.",
abstract = "Este trabalho prop{\~o}e uma investiga{\c{c}}{\~a}o detalhada
dos v{\'a}rios aspectos envolvidos no crescimento de interfaces
de CaF2 e BaF2 sobre Si (111), utilizando-se a t{\'e}cnica de
Molecular Beam Epitaxy (MBE) e an{\'a}lise in situ com Reflection
High Energy Electron Diffraction (RHEED). O objetivo {\'e}
conseguir estabelecer um conjunto m{\'{\i}}nimo de
condi{\c{c}}{\~o}es para que se possam obter de forma
sistem{\'a}tica e reprodut{\'{\i}}vel camadas de CaF2 e BaF2
sobre Si (111) adequadas ao posterior crescimento de compostos
IV-VI para a fabrica{\c{c}}{\~a}o monol{\'{\i}}tica de
detectores de radia{\c{c}}{\~a}o infravermelha integrados ao Si.
A Caracteriza{\c{c}}{\~a}o p{\'o}s-crescimento das camadas de
CaF2 e BaF2 envolve medidas estruturais de raio-X de alta
resolu{\c{c}}{\~a}o, nas configura{\c{c}}{\~o}es de Bragg
Brentano, Rocking Curve e Reflex{\~a}o de raios-X em
incid{\^e}ncia rasante, bem como medidas com o microsc{\'o}pio
eletr{\^o}nico de varredura. As medidas permitem a
obten{\c{c}}{\~a}o de informa{\c{c}}{\~a}o sobre a qualidade
cristalina das camadas, o relaxamento das tens{\~o}es
mec{\^a}nicas originadas devido {\`a} discrep{\^a}ncia de
par{\^a}metros de rede entre as v{\'a}rias camadas, espessura e
rugosidade do filme crescido. ABSTRACT: This work investigates in
details the growth of CaF2 and BaF2 buffer layers on Si (111)
substrates by using Molecular Beam Epitaxy (MBE) technique and in
situ Reflection High Energy Electron Diffraction (RHEED) analisys.
The main goal is to obtain a minimum set of conditions capable to
make the growth of PbTe and PbSnTe compounds on buffered Si (111)
substrates a reliable and reproducible procedure. The
characterization after growth of the epitaxial CaF2 and BaF2
layers involves high resolution x-rays diffraction measurements
using Bragg Brentano method, rocking curves and grazing incidence
x-ray reflectivity, as well as scanning electron microscopy. These
measurements inform about crystal quality of the layers and strain
releaf between buffer and substrate due to lattice parameters
differences.",
committee = "An, Chen Ying (presidente) and Boschetti, C{\'e}sar (orientador)
and Guimar{\~a}es, Sonia",
copyholder = "SID/SCD",
englishtitle = "Epitaxial growth of CaF2 and BaF2 buffer layers on silicon
substrates for PbTe PbEuTe heterostructure development",
language = "pt",
pages = "123",
ibi = "6qtX3pFwXQZGivnK2Y/Px6vM",
url = "http://urlib.net/ibi/6qtX3pFwXQZGivnK2Y/Px6vM",
targetfile = "publicacao.pdf",
urlaccessdate = "14 maio 2024"
}