%0 Journal Article
%4 sid.inpe.br/mtc-m21b/2016/06.07.16.28
%2 sid.inpe.br/mtc-m21b/2016/06.07.16.28.16
%@doi 10.1134/S102745101603037X
%@issn 1027-4510
%T Plasma sputtering of Pb1–x Eu x Te films with varied composition and structure
%D 2016
%8 May
%9 journal article
%A Zimin, S. P.,
%A Amirov, I. I.,
%A Gorlachev, E. S.,
%A Naumov, V. V.,
%A Abramof, Eduardo,
%A Rappl, Paulo Henrique de Oliveira,
%@affiliation Demidov State University
%@affiliation Russian Academy of Sciences
%@affiliation Russian Academy of Sciences
%@affiliation Russian Academy of Sciences
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@electronicmailaddress zimin@uniyar.ac.ru
%@electronicmailaddress
%@electronicmailaddress
%@electronicmailaddress
%@electronicmailaddress eduardo.abramof@inpe.br
%@electronicmailaddress paulo.rappl@inpe.br
%B Journal of Surface Investigation: X-ray, Synchroton and Neutron Techniques
%V 10
%N 3
%P 623-626
%K lead chalcogenides, molecular-beam epitaxy, films, high-frequency inductively coupled argon plasma, plasma surface treatment.
%X We investigate the sputtering of single-crystal and polycrystalline films of Pb1x Eu x Te (x = 0.020.10) in high-frequency inductively coupled argon plasma. Layers of Pb1x Eu x Te are grown via molecular beam epitaxy on barium-fluoride substrates of the (111) orientation at 340 and 200°C. For single-crystal films, the dependence of the sputtering rate on the europium concentration is found. For polycrystalline layers, a decrease in the sputtering rate is observed. This is caused by the effect of europium oxidation at the surface of the polycrystallites.
%@language en