@Article{PessoaSCDFRTFMLM:2017:PrEfC.,
               author = "Pessoa, R. S. and Santos, V. P. dos and Cardoso, S. B. and Doria, 
                         A. C. O. C. and Figueira, F. R. and Rodrigues, B. V. M. and 
                         Testoni, G. E. and Fraga, Mariana Amorim and Marciano, F. R. and 
                         Lobo, A. O. and Maciel, H. S.",
          affiliation = "{Universidade do Vale do Para{\'{\i}}ba (UNIVAP)} and 
                         {Universidade do Vale do Para{\'{\i}}ba (UNIVAP)} and 
                         {Universidade Brasil} and {Universidade do Vale do 
                         Para{\'{\i}}ba (UNIVAP)} and {Universidade do Vale do 
                         Para{\'{\i}}ba (UNIVAP)} and {Universidade Brasil} and 
                         {Instituto Tecnol{\'o}gico de Aeron{\'a}utica (ITA)} and 
                         {Instituto Nacional de Pesquisas Espaciais (INPE)} and 
                         {Universidade Brasil} and {Universidade Brasil} and {Universidade 
                         do Vale do Para{\'{\i}}ba (UNIVAP)}",
                title = "TiO2 coatings via atomic layer deposition on polyurethane and 
                         polydimethylsiloxane substrates: properties and effects on C. 
                         albicans growth and inactivation process",
              journal = "Applied Surface Science",
                 year = "2017",
               volume = "422",
                pages = "73--84",
                month = "Nov.",
             keywords = "Atomic layer deposition, Titanium dioxide, Polyurethane, 
                         Polydimethylsiloxane, Candida albicans, Fungistatic effect, Fungal 
                         inactivation.",
             abstract = "Atomic layer deposition (ALD) surges as an attractive technology 
                         to deposit thin films on different substrates for many advanced 
                         biomedical applications. Herein titanium dioxide (TiO2) thin films 
                         were successful obtained on polyurethane (PU) and 
                         polydimethylsiloxane (PDMS) substrates using ALD. The effect of 
                         TiO2 films on Candida albicans growth and inactivation process 
                         were also systematic discussed. TiCl4 and H2O were used as 
                         precursors at 80 °C, while the reaction cycle number ranged from 
                         500 to 2000. Several chemical, physical and physicochemical 
                         techniques were used to evaluate the growth kinetics, elemental 
                         composition, material structure, chemical bonds, contact angle, 
                         work of adhesion and surface morphology of the ALD TiO2 thin films 
                         grown on both substrates. For microbiological analyses, yeasts of 
                         standard strains of C. albicans were grown on non- and TiO2-coated 
                         substrates. Next, the antifungal and photocatalytic activities of 
                         the TiO2 were also investigated by counting the colony-forming 
                         units (CFU) before and after UV-light treatment. Chlorine-doped 
                         amorphous TiO2 films with varied thicknesses and Cl concentration 
                         ranging from 2 to 12% were obtained. In sum, the ALD TiO2 films 
                         suppressed the yeast-hyphal transition of C. albicans onto PU, 
                         however, a high adhesion of yeasts was observed. Conversely, for 
                         PDMS substrate, the yeast adhesion did not change, as observed in 
                         control. Comparatively to control, the TiO2-covered PDMS had a 
                         reduction in CFU up to 59.5% after UV treatment, while no 
                         modification was observed to TiO2-covered PU. These results 
                         pointed out that ALD chlorine-doped amorphous TiO2 films grown on 
                         biomedical polymeric surfaces may act as fungistatic materials. 
                         Furthermore, in case of contamination, these materials may also 
                         behave as antifungal materials under UV light exposure.",
                  doi = "10.1016/j.apsusc.2017.05.254",
                  url = "http://dx.doi.org/10.1016/j.apsusc.2017.05.254",
                 issn = "0169-4332",
             language = "en",
           targetfile = "pessoa_ti.pdf",
        urlaccessdate = "26 abr. 2024"
}