@Article{SilvaBern:2021:MuPoSi,
author = "Silva, Ana Carolina Fernandes da and Berni, Luiz Angelo",
affiliation = "{Universidade Federal de S{\~a}o Paulo (UNIFESP)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)}",
title = "Multilayer porous silicon as visible radiation absorber",
journal = "Optical Materials",
year = "2021",
volume = "112",
pages = "e110795",
month = "Feb.",
keywords = "porous silicon, black silicon, reflectance, electrochemical
etching.",
abstract = "Since its accidental discovery in the mid-1950s, porous silicon
has attracted great interest due to its wide range of
applications. One of them that has been the subject of recent
studies is the use of this material as black silicon, in which
with the continuous or gradual variation of the refractive index
it is possible to significantly reduce the reflectance of silicon
surface. In this work, several samples of this material were
produced in order to analyze the feasibility of using porous
silicon as a radiation absorber in the visible region. The best
results obtained were for samples with six layers with refractive
index ranging from 1.4 to 2.4, total thickness of 10,800 nm and
reflectance of 5%. The influence of porous layer thickness on the
reflectance profile was also observed.",
doi = "10.1016/j.optmat.2020.110795",
url = "http://dx.doi.org/10.1016/j.optmat.2020.110795",
issn = "0925-3467",
language = "en",
targetfile = "silva_multilayer.pdf",
urlaccessdate = "20 maio 2024"
}