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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TTNP
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.13.11
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.13.11.35
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoMarcondesUedaOliv:2009:TrRiFl
TítuloTreatment of Rigid and Flexible Polymers by Plasma Immersion Ion Implantation for Space Applications
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Marcondes, A. R.
2 Ueda, Mário
3 Oliveira, R. M.
Grupo1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 13:12:22 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
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ResumoSurface modification of polymers has growth a lot in the last decades due to the necessity to combine the unique bulk properties of those materials with some selected surface properties that can be tailored for specific applications. Among the rigid polymers suitable for space use there is the Ultra-High Molecular Weight Polyethylene (UHMWPE), a polymer with outstanding physical and chemical properties which is currently used in multiple areas. Despite the unique properties of UHMWPE, some effort need to be made in order to adequate its surface properties to withstand the Low Earth Orbit (LEO) space environment which is rich in harmful species like atomic oxygen, UV-rays and space debris. Flexible polymers have also a widespread use in satellites and space station but as any other material it shows use life limitation due to atomic oxygen degradation. In this work is presented the results that have been achieved when treating UHMWPE and films of Kapon® by Plasma Immersion Ion Implantation (PIII) where the workpieces were pulsed to a high negative voltage in nitrogen and argon plasma respectively. For UHMWPE pulse intensities of 5, 10 and 15kV were applied to the samples. Others parameters like pulse duration (10 and 20ìs), treatment time (15, 30, 45 and 60min), and metallic grid distance to the sample (2 and 10 mm) were also varied. In all cases Raman spectroscopy has indicated the formation of Diamond-Like Carbon (DLC) in the UHMWPE surface with improvement on properties like hardness (by a factor of 1.6) and elastic modulus, as confirmed by nanohardness measurements. XPS characterization was used to assure the nitrogen ions implanted in the polymer were linked to carbon atoms instead of forming clusters. XPS also indicated a relative high fraction of sp3 carbons which is in agreement with the same information obtained from Raman spectra.The fraction has varied from 10 to 60% depending on the treatment condition. The several set of treatment conditions have led to some important conclusions about the influence of pulse intensity, time treatment, pulse duration and grid distance on the DLC formation. In general DLC formation, or the intensities of G and D bands related to, respectively, sp2 and sp3 carbons increases with higher pulse intensities. The treatment time has the same influence on DLC formation. Grid distance seems to have little influence on DLC formation but based on data obtained so far it is possible to conclude that closer the grid better the ion implantation. And with respect to pulse duration, the results have confirmed what was expected. Longer pulse duration seems worse to DLC formation. That was confirmed by Raman spectroscopy since longer the pulse duration higher the expected accumulated charge in the polymer surface. Samples of Kapton® films have also been treated by PIII using an aluminum source of ions. The previous results have shown a significant color modification in the film surface. The ion implantation and the expected increase in the surface hardness will be confirmed by XPS and nanohardness characterization in the following.
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6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TTJB
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.13.09
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.13.09.28
Última Atualização dos Metadados2020:04.28.17.49.06 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoMirandaUedBalBelFer:2009:TrNaDi
TítuloTreatment of Nanocrystalline Diamond Films by Nitrogen Implantation Using PIII Processing
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Miranda, C. R. B.
2 Ueda, Mário
3 Baldan, Maurício Ribeiro
4 Beloto, Antonio Fernando
5 Ferreira, Neidenei Gomes
Grupo1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
5 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 13:09:28 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
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ResumoIn this work was studied the electrochemical behavior of nanocrystalline diamond films (NCD) implanted with N2 by Plasma Immersion Ion Implantation (PIII). The NCD films were grown on silicon substrate by Chemical Vapor Deposition process using a hot filament reactor. Electrodes of doped microcrystalline diamond films with boron (BDD), nitrogen, metals or metallic groups have been extensively used to electrochemical applications because they are superior in relation to other materials, such as, vitreous carbon, graphite and platinum. These films have demonstrated to be a suitable electrode due to its extreme and beneficial properties such as mechanical hardness, chemical inertness, wide potential window, excellent stability, reproducibility and controlled conductivity, depending on the electrode doping level, morphology and microstructure. The high importance of synthetic conductive diamond is correlated to demanding applications such as wastewater treatment, electroanalysis, electrosyntesis and energy storage devices. In addition, experiments on NCD electrodes have given results that are quite similar to those obtained with BDD electrodes with some advantages. In this way, the objective of this work is to improve the properties of NCD electrodes with N2 implantation. Before and after the implantation, NCD films was investigated using scanning electron microscopy, high resolution X-ray diffraction and Raman scattering spectroscopy. Electrochemical characterization showed that NCD films treated have great potential for electrochemical application.
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TTDS
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.13.07
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.13.07.53
Última Atualização dos Metadados2020:04.28.17.49.06 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoCorreaUeMaMiBaFe:2009:ImElRe
TítuloImprovement of Electrochemical Response of Diamond Film with Sulfur Addition by Nitrogen Plasma Immersion Ion Implantation
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Correa, W. L. A.
2 Ueda, Mário
3 Matsushima, J. T.
4 Miranda, C. R. B.
5 Baldan, Maurício Ribeiro
6 Ferreira, Neidenei Gomes
Grupo1
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
5 LAP-CTE-INPE-MCT-BR
6 LAP-CTE-INPE-MCT-BR
Afiliação1 Universidade São Francisco
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
6 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 13:07:53 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
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Tipo do ConteúdoExternal Contribution
ResumoThe purpose of this work was to investigate the effects of nitrogen plasma immersion ion implantation on diamond film with sulfur addition. The diamond film was grown on Si substrate by hot filament chemical vapor deposition (HFCVD). It was examined how added sulfur influences the diamond growth rate, morphology, growth orientation and the crystal quality as well as the improvement of electrochemical response by nitrogen plasma ion implantation. The morphology and structure of the film were studied by scanning electron microscopy (SEM) and visible Raman spectroscopy techniques, respectively. Plasma immersion ion implantation technique showed good nitrogen implanted profile. For nitrogen implantation, a DC glow discharge plasma of 1x1010 cm-3 density were produced in a 1 mTorr nitrogen gas pressures and a high voltage pulses of 12 kV amplitude, 50 ìs duration and 300 Hz repetition frequency. The characterization of the working potential window and capacitive currents were obtained by cyclic voltammetry measurements. The results showed that electrochemical response of the diamond films were improved by nitrogen plasma ion implantation, however the film morphology is crucial to analyze the results from cyclic voltammograms.
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TT52
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.13.03
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.13.03.26
Última Atualização dos Metadados2020:04.28.17.49.06 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoSilvaReUeFrOlMoBa:2009:EvPlIm
TítuloEvaluation of Plasma Immersion Ion Implantation in the Creep Resistance of Ti-6Al- 4V Alloy
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Silva, M. M.
2 Reis, D. A. P.
3 Ueda, Mário
4 Freitas, F. E.
5 Oliveira, V. S.
6 Moura Neto, C.
7 Barboza, M. J. R.
Grupo1
2
3 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Tecnológico de Aeronáutica
2 Instituto Tecnológico de Aeronáutica
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Tecnológico de Aeronáutica
5 Instituto Tecnológico de Aeronáutica
6 Instituto Tecnológico de Aeronáutica
7 Escola de Engenharia de Lorena – EEL-USP
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 13:03:26 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
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Tipo do ConteúdoExternal Contribution
ResumoThe search for alloys with improved high-temperature specific strength and creep-resistance properties for aerospace applications has led in the last decades to sustained research activities to develop new alloys and/or improve existing ones. Titanium and its alloys are excellent for applications in structural components submitted to high temperatures owing to their high strength to weight ratio, good corrosion resistance and metallurgical stability. Its high creep resistance is of great importance in enhancing engine performance. However, the affinity by oxygen is one of main factors that limit its application as structural material at high temperatures. Materials with adequate behavior at high temperatures and aggressive environmental became a scientific requirement, technological and economically nowadays. The objective of this work is the mechanical and microstructural characterization of the Ti-6Al-4V alloy after treatment by nitrogen Plasma Immersion Ion Implantation (PIII) process. The aim of this process is the improvement of superficial mechanical properties of the Ti-6Al-4V alloy. The selected alloy after ionic implantation process by plasma immersion was submitted to creep tests in 600 ºC, in constant load mode at 250 and 319 MPa. The techniques used in this work were optical microscopy and scanning electronic microscopy. The fractograph analysis of the samples tested in creep shows narrowing phenomena and microcavities. The creep results show the significant increase of material resistance, it can be used as protection of oxidation in high temperatures applications.
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TSGE
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.12.56
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.12.56.56
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoOliveiraGonUedRosRiz:2009:HiPlIm
TítuloHigh-temperature plasma immersion ion implantation into metallic substrates
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Oliveira, Rogério de Moraes
2 Gonçalves, José Américo Neves
3 Ueda, Màrio
4 Rossi, José Osvaldo
5 Rizzo, P. N.
Grupo1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
5 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 12:56:56 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
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Tipo do ConteúdoExternal Contribution
ResumoThe temperature of the substrate has strong influence on the diffusion coefficient of nitrogen ions during PIII performed in metallic surfaces, which affect the ion implantation profiles and can lead to the formation of thick implanted layers. In order to heat conveniently a large spectrum of metals and metallic alloys in vacuum and in the presence of plasma, as mandatory for efficient PIII, it is necessary to count on a stable heat source, able to reach steady temperatures in the range of 400oC to more than 1000 oC. This has been accomplished in the current experiment by means of a thermionic cathode composed of a rolled tantalum foil covered with (Ba,Sr,Ca)O. Work function of this electron source is around 1.2 eV, which is much lower than 4.5 eV of typically used tungsten filament. Metallic samples, in this case, are the anode of the discharge itself, being polarized during the heating cycle by positive DC voltages about 500V. They are implanted with negative pulses of 10 kV/300Hz/40ìs. Comparison among metallic layers treated under distinct temperature values will be accomplished by evaluating their corrosion resistance and tribological properties. Samples will also be analyzed by X-ray diffraction, SEM and XPS.
ÁreaFISPLASMA
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TSC2
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.12.54
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.12.54.15
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoSilvaKaReUeMoBa:2009:InMiSu
TítuloInfluence of Microstructural and Superficial Treatments in the Mechanical and Corrosion Resistance of Ti-6Al-4V Alloy
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Silva, M. M.
2 Kabayama, S. C. B.
3 Reis, D. A. P.
4 Ueda, Mário
5 Moura Neto, C.
6 Barboza, M. J. R.
Grupo1
2 LAP-CTE-INPE-MCT-BR
3
4 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Tecnológico de Aeronáutica
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Tecnológico de Aeronáutica
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Tecnológico de Aeronáutica
6 Escola de Engenharia de Lorena – EEL-USP
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 12:54:16 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
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ResumoThis study aimed to evaluate the influence of microstructural and superficial treatments in the mechanical and corrosion resistance Ti-6Al-4V alloy. It was used a Ti-6Al-4V alloy in cylindrical bars forms, forged condition and annealing at 190 oC for 6 hours and cooled in air. Three different conditions of heat treatments were utilized to obtain the following microstructures: Widmanstätten, Martensite e Bimodal. It was also analyzed samples with superficial treatment of Plasma Immersion Ion Implantation (PIII) process and ceramic coating by plasma spray. In the PIII treatment the samples was put in a vacuum reactor (76x10-3 Pa) and implanted by nitrogen ions in time intervals between 15 and 120 minutes. Yttria (8 wt.%) stabilized zirconia (YSZ) with a CoNiCrAlY bond coat was atmospherically plasma sprayed on Ti-6Al-4V specimens. Constant load creep tests were conducted with Ti- 6Al-4V alloy at 600°C. The alloy with Widmanstätten structure shows greater resistance to creep and oxidation with a longer life time in creep. Potentiodynamic corrosion tests in 0.9 % NaCl aqueous solution, pH 6.0, at room temperature (~25oC), were carried out on the Ti-6Al-4V alloys thermally treated and modified surfaces. Comparison between the corrosion parameters of the treated alloy and modified surface, showed that the anodic and cathodic current densities so simulate. This result suggests that the surface modified by PIII is also efficient in the protection of Ti-6Al-4V alloy against corrosion.
ÁreaFISPLASMA
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Repositório Espelhosid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364QP28
Repositóriosid.inpe.br/mtc-m18@80/2009/09.21.19.49
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.21.19.49.05
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoBaldisseraUedaMellLepi:2009:CoReCo
TítuloCorrosion Resistance of CoCrMo Alloy by Plasma Immersion Ion Implantation Technique
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Baldissera, Silmara Cristina
2 Ueda, Mário
3 Mello, Carina Barros
4 Lepienski, C. M.
Grupo1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 UFPR
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-21 19:49:06 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
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ResumoCoCrMo alloys are widely used for medical applications because of their excellent mechanical and corrosion properties. However, when placed in vivo, these alloys release Co, Cr, Mo ions to host tissues. Protective layer on the alloys surface were formed by Plasma Immersion Ion Implantation (PIII). In this study, a nitrogen ion was implanted on CoCrMo alloy samples surfaces at 700oC, 5kV, 400Hz and 40ìs of pulse length, during 1 and 2 hours. Potentiodynamic corrosion tests in 0.9% NaCl aqueous solution, pH 6.0, at room temperature (~25oC), were carried out on the CoCrMo alloys modified surfaces. in comparison between 1h and 2h treatments, the sample that was treated by 2h presents higher corrosion potential (Ecorr) and higher polarization resistance than those obtained with 1h treatment. Electrochemical Impedance Spectroscopy (EIS) was also applied to study the surfaces samples electrochemical behavior with 1h and 2h treatments for which the modified surfaces were exposed to 0.9% NaCl aqueous solutions for 7 days of immersion. The EIS results simulated equivalent electrical circuit models for porous films. The treated samples surfaces morphology was observed by SEM, and its mechanical resistance was determined by pin-on-disc wear test, and nanoindentations.
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364QNQP
Repositóriosid.inpe.br/mtc-m18@80/2009/09.21.19.47
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.21.19.47.40
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoFernandesUedaRangSchn:2009:SuEnCh
TítuloSurface Energy Characterization of Nitrogen Implanted Titanium Alloys
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Fernandes, F. A. P.
2 Ueda, Mário
3 Rangel, E. C.
4 Schneide, S. G.
Grupo1
2 LAP-CTE-INPE-MCT-BR
Afiliação1 Universidade de São Paulo
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Unesp
4 Universidade de São Paulo
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-21 19:47:40 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
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ResumoTitanium alloys have been largely employed as surgical implants in hard tissue replacement, especially beta titanium alloys, however these alloys often fail due to poor tribological properties. Surface engineering techniques can be applied to increase the longevity of titanium implants improving various surface properties. Plasma Immersion Ion Implantation (PI3), a physical method of surface engineering, was performed on the surface of Ti- 13Nb-13Zr and Ti-6Al-4V biomedical alloys under different conditions. It was evaluated the influence of PI3 pulse amplitude on the surface characteristics, such as topography and surface free energy. The results have shown that nitrogen implantation promotes a surface modification in terms of topography and contact angle, generating a surface free energy level reported as adequate to cell proliferation for biomedical applications.
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Repositório Espelhosid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364QNLB
Repositóriosid.inpe.br/mtc-m18@80/2009/09.21.19.45
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.21.19.45.51
Última Atualização dos Metadados2020:04.28.17.49.06 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoDallaquaTan:2009:IoTeMe
TítuloIon Temperature Measurements in a Vacuum ARC Plasma Source
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Dallaqua, Renato Sérgio
2 Tan, Ing Hwie
Grupo1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-21 19:45:51 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
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ResumoVacuum arc discharge based plasma sources have been extensively used in applications of thin film deposition and ion implantation. Besides its versatility in producing a great variety of metallic ions, the high density, low temperature and multiple charged ions are interesting characteristics in many technological applications. Nevertheless, due to complex phenomena occurring in this type of plasma, no theoretical model can completely describe al the processes in this system. Measurements of cathode erosion, burning voltage and charge state distribution among other parameters have been done in different experimental conditions. Ion temperature has received little attention and its measurement has been sparsely reported in the literature. In this work we present ion temperature measurements made in a carbon vacuum arc discharge varying the plasma current and axial magnetic field. The results were obtained in the PCEN experiment, (1m long, 0.22m diameter cylindrical chamber, base pressure 10-4 Pa), with axial magnetic field varying from 0 to 0.7T, and plasma currents up to 2.5 kA. A 13ms flat top discharge can be achieved with a pulse forming network. Ion temperature was obtained from Doppler broadening measurements of the 657.98nm CII carbon ion line, made with a Fabry-Perot interferometer and a monochromator used to isolate the 657.99nm and 658.47nm lines. The interferometer was adjusted with a free spectral range of 0.21nm, typical finesse 30 and 0.007nm resolution. Typical Doppler broadenings varied from 0.03-0.04nm. For a 2kA plasma current, the ion temperature decreased from 7ev to 4eV as the magnetic field increased from 0 to 0.2T. On the other hand, increase in current up to 2.5kA for fixed 0.05T magnetic field did not change the 5.9 eV ion temperature.
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Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
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Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364QNJ5
Repositóriosid.inpe.br/mtc-m18@80/2009/09.21.19.44
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.21.19.44.02
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Chave SecundáriaINPE--PRE/
Chave de CitaçãoPillacaKostUedaSilv:2009:StInSt
TítuloStudy of the Influence of a Static Magnetic Field on the Plasma Immersion Ion Implantation Process
Ano2009
Data de Acesso16 abr. 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Pillaca, E. J. D. M.
2 Kostov, K. G.
3 Ueda, Mário
4 Silva Júnior, A. R.
Grupo1
2
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
Afiliação1 UNESP
2 UNESP
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-21 19:44:03 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
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ResumoPlasma immersion ion implantation (PIII) is an established method for the treatment and surface modification of materials. This technique is fast and efficient in treating 3D targets, however, PIII owns some disadvantages. Perfect dose uniformity is usually difficult to achieve when treating samples of complex shape. The problem arises from the uncontrolled expansion of plasma sheath. Several studies have shown that to obtain an uniform implantation the extension of plasma sheath must be kept always small in relation to target size. Recent studies have demonstrated that the sheath expansion as well as secondary electrons dynamics in PIII are significantly affected by an external magnetic field, especially in the case when the magnetic field is parallel to the workpiece surface. in this work, we have analyzed by means of numerical simulation the effect of external magnetic field on the PIII process. The magnetic field configuration is similar to that of magnetic trap and is produced by a set of external coils. The simulation has been carried out for nitrogen plasma using the 2.5D computer code KARAT that employs the particle-in-cell (PIC) algorithm. It is found that a high density plasma region is formed around the target due to intense background gas ionization by the magnetized electrons drifting in the crossed ExB field. As a result, the sheath expansion is suppressed and an increase of implantation current in comparison to the PIII process without magnetic field is observed. Later, the validity of numerical simulation has been investigated experimentally. The plasma parameters were determined from the characteristic curve of a double Langmuir prove. The results show that magnetic field configuration ensures efficient plasma confinement in the center of the vacuum chamber where the magnetic field has minimum value. This result is in agreement with the numerical simulation.
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Conteúdo da Pasta docnão têm arquivos
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Repositório Espelhosid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
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