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1. Identity statement
Reference TypeJournal Article
Sitemarte3.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZ3r59YCT/H3Lni
Repositorysid.inpe.br/iris@1905/2005/08.04.03.13   (restricted access)
Last Update2007:11.19.16.36.12 (UTC) administrator
Metadata Repositorysid.inpe.br/iris@1905/2005/08.04.03.13.18
Metadata Last Update2018:06.06.03.55.45 (UTC) administrator
Secondary KeyINPE-14925-PRE/9838
ISSN0963-0252
1361-6595
Label10531
Citation KeyTanUDRBAIT:2002:MaPlIm
TitleMagnesium plasma immersion ion implantation in a large straight magnetic duct
Year2002
Secondary Date20021212
MonthAug.
Access Date2024, Apr. 28
Secondary TypePRE PI
Number of Files1
Size201 KiB
2. Context
Author1 Tan, I. H.
2 Ueda, Mario
3 Dallaqua, Renato Sergio
4 Rossi, J. O.
5 Beloto, Antonio Fernando
6 Abramof, Eduardo
7 Inoue, Y.
8 Takai, O.
Group1 LAP-INPE-MCT-BR
2 LAS-INPE-MCT-BR
JournalPlasma Sources Science and Technology
Volume11
Number3
Pages317-323
History (UTC)2006-11-14 18:52:47 :: administrator -> jefferson ::
2007-11-19 16:36:13 :: jefferson -> administrator ::
2018-06-06 03:55:45 :: administrator -> marciana :: 2002
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsFISICA E TECNOLOGIA DE MATERIAIS
SURFACE MODIFICATION
CENTRIFUGE
AbstractMagnesium ions were implanted on silicon wafers using a vacuum arc plasma system with a straight 1m long magnetic duct, 0.22 m in diameter. Good macroparticle filtering was obtained in samples positioned facing the plasma stream and complete filtering was achieved in samples with surfaces parallel to the plasma stream and magnetic field. Deposition is also minimized by placing sample surfaces parallel to the plasma stream. High resolution x-ray diffraction rocking curves of impianted samples show that the changes in lattice constant are due to compressive strain. and the distortion is larger for higher voltages. Without magnetic field the implantation was a few hundred angstroms deep, as expected, but with magnetic field the depth profile was surprisingly extended to over 0.1 mum, a fact for which we do not yet have a convincing explanation, but could be related to radiation enhanced segregation. The presence of a magnetic field increases substantially the retained implantation dose due to the increase in plasma density by two orders of magnitude.
AreaFISMAT
Arrangement 1urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Magnesium plasma immersion...
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4. Conditions of access and use
Target Filemagnesium plasma immersion ion, tan.pdf
User Groupadministrator
jefferson
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft12
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES.
Host Collectionsid.inpe.br/banon/2001/04.03.15.36
6. Notes
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7. Description control
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