| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | mtc-m16.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZ3r59YDa/FEhhq |
| Repository | sid.inpe.br/iris@1916/2005/04.04.14.28 (restricted access) |
| Last Update | 2005:04.04.03.00.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/iris@1916/2005/04.04.14.28.13 |
| Metadata Last Update | 2018:06.05.01.28.20 (UTC) administrator |
| Secondary Key | INPE-12291-PRE/7611 |
| ISSN | 0168-583X 0167-5087 |
| Citation Key | UedaGBRBBAR:2000:PlImIo |
| Title | Plasma immersion ion implantation using a glow discharge source with controlled plasma potential  |
| Year | 2000 |
| Access Date | 2024, Apr. 28 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 200 KiB |
| 2. Context | |
| Author | 1 Ueda, Mario| 2 Gomes, Geraldo F. 3 Berni, L. A. 4 Rossi, J. O. 5 Barroso, Joaquim Jose 6 Beloto, Antonio Fernando 7 Abramof, Eduardo 8 Reuther, H |
| Resume Identifier | 1 2 3 4 5 6 8JMKD3MGP5W/3C9JGJ8 7 8JMKD3MGP5W/3C9JGUH |
| Group | 1 LAP-INPE-MCT-BR 2 LAS-INPE-MCT-BR |
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 Campos, S. Paulo, Brazil 3 Research Center Rossendorf, Institute of Ion Beam Physics and Materials Research, Dresden, Germany |
| e-Mail Address | erich@sid.inpe.br |
| Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| Volume | 161-163 |
| Pages | 1064-1068 |
| History (UTC) | 2005-04-04 17:45:51 :: sergio -> administrator :: 2007-04-04 20:50:36 :: administrator -> sergio :: 2008-01-07 12:52:40 :: sergio -> administrator :: 2008-06-10 22:24:36 :: administrator -> marciana :: 2009-08-28 20:58:55 :: marciana -> erich@sid.inpe.br :: 2010-05-14 02:58:32 :: erich@sid.inpe.br -> administrator :: 2018-06-05 01:28:20 :: administrator -> marciana :: 2000 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | Plasma sources Plasma immersion ion implantation Surface analysis |
| Abstract | A DC glow discharge plasma source was used in a plasma immersion ion implantation (PIII) experiment providing nitrogen plasmas with densities of 1±31010 cmÿ3 and temperatures of 5±10 eV. Nitrogen ions were extracted from these plasmas and implanted in a variety of immersed samples (Al 5040, SS 304, Si) using repetitive high voltage pulses from two types of sources: PFN pulser and a hard tube pulser. Due to the high potential present in our plasma (350 V), a signi®cant sputter etching of the samples surface occurred at long irradiation times. An electron shower source was used to lower this potential allowing its control from 0 to 350 V. Operating the plasma source at potentials below 70 V reduced the sputtering to negligible levels and a retained dose of 1:5 1017 cmÿ2 was achieved in a silicon surface, after irradiation of 1500 min. For plasma with potential of 350 V (no electron shower), the retained doses in Al 5040 and SS 304 samples were smaller than 5 1016 cmÿ2, for same plasma and pulser conditions (but 2500 min irradiation), con®rming the deleterious eects of sputtering measured in Si samples. Upon using the higher repetition rate pulser, the treatment time was reduced by a factor of 700, thus easing considerably the sputtering problem. Ó 2000 Elsevier Science B.V. All rights reserved. |
| Area | FISMAT |
| Arrangement 1 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Plasma immersion ion... |
| Arrangement 2 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma immersion ion... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | plasma immersion.pdf |
| User Group | administrator erich@sid.inpe.br sergio |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ESR3H2 8JMKD3MGPCW/3ET2RFS |
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
| Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi electronicmailaddress format isbn label lineage mark mirrorrepository month nextedition notes number orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |