| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | mtc-m16.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZ3r59YDa/JgGjw |
| Repository | sid.inpe.br/iris@1916/2005/11.25.17.28 (restricted access) |
| Last Update | 2005:11.25.17.28.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/iris@1916/2005/11.25.17.28.04 |
| Metadata Last Update | 2018:06.05.01.16.14 (UTC) administrator |
| Secondary Key | INPE-13205-PRE/8461 |
| ISSN | 0168-583X 0167-5087 |
| Citation Key | ReisBeloUeda:2005:AnEfSa |
| Title | Annealing effects in samples of silicon implanted with helium by plasma immersion ion implantation  |
| Project | Implantação iônica por imersão em plasma (IIIP) |
| Year | 2005 |
| Month | Oct. |
| Access Date | 2024, Apr. 27 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 206 KiB |
| 2. Context | |
| Author | 1 Reis, J. C. N. 2 Beloto, Antonio Fernando 3 Ueda, Mário |
| Resume Identifier | 1 2 8JMKD3MGP5W/3C9JGJ8 3 8JMKD3MGP5W/3C9JHSB |
| Group | 1 LAP-INPE-MCT-BR 2 LAP-INPE-MCT-BR 3 LAP-INPE-MCT-BR |
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 2 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 3 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) |
| Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| Volume | 240 |
| Number | 1-2 |
| Pages | 219-223 |
| History (UTC) | 2005-12-07 13:39:56 :: sergio -> administrator :: 2007-04-04 20:50:35 :: administrator -> sergio :: 2008-01-07 12:53:13 :: sergio -> marciana :: 2008-02-25 14:28:03 :: marciana -> administrator :: 2018-06-05 01:16:14 :: administrator -> marciana :: 2005 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | MATERIALS PHYSICS PIII Ion implantation Photoluminescence Annealing Insulator material technology Nitrogen Temperature PIII FÍSICA DE MATERIAIS Implantação iônica Fotoluminescência Tecnologia Nitrogêneo Temperatura |
| Abstract | Silicon samples were implanted with helium using plasma immersion ion implantation (PIII). The effects of implantation were analyzed by Raman spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM) and reflectance measurements before and after PIII, and after annealing (325 degrees C, for 30, 60 and 90 min and 450 degrees C for 30 min, in nitrogen atmosphere). After annealing, large bubbles were observed from SEM images and a connection between surface microstructure and materials properties was analyzed through AFM measurements. It was observed a reduction of the reflectance and an increase of the peak intensity of the photoluminescence (PL) with the increasing of the annealing time. |
| Area | FISPLASMA |
| Arrangement | Fonds > Produção anterior à 2021 > LABAP > Annealing effects in... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | annealing effects.pdf |
| User Group | administrator marciana sergio |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ET2RFS |
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
| Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |