| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | marte3.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZsFDuKxG/zagrB |
| Repository | sid.inpe.br/marciana/2003/08.15.15.44 (restricted access) |
| Last Update | 2004:03.29.03.00.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/marciana/2003/08.15.15.44.24 |
| Metadata Last Update | 2018:06.06.03.57.14 (UTC) administrator |
| Secondary Key | INPE-9885-PRE/5458 |
| ISSN | 0168-583X 0167-5087 |
| Citation Key | BelotoSiSeKuLeUe:2003:PhReMe |
| Title | Photoluminescence and reflectance measurements on annealed porous silicon implanted with nitrogen by plasma immersion ion implantation (PIII)  |
| Year | 2003 |
| Month | May |
| Access Date | 2024, Apr. 28 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 171 KiB |
| 2. Context | |
| Author | 1 Beloto, Antonio Fernando 2 Silva, Marcos Dias da 3 Senna, José Roberto 4 Kuranaga, Carlos 5 Leite, Nélia Ferreira 6 Ueda, Mário |
| Group | 1 LAS-INPE-MCT-BR 2 LAP-INPE-MCT-BR |
| Affiliation | 1 Inst Nacl Pesquisas Espaciais, Lab Associado Sensores & Mat, BR-12245970 Sao Jose Dos Campos, Brazil 2 Inst Nacl Pesquisas Espaciais, Lab Associado Plasma, BR-12245970 Sao Jose Dos Campos, Brazil |
| Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| Volume | 206 |
| Pages | 677-681 |
| History (UTC) | 2018-06-06 03:57:14 :: administrator -> marciana :: 2003 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | porous silicon plasma immersion ion implantation photoluminescence reflectance |
| Abstract | Porous Silicon (PS), approximately 1 mum thick, was obtained from n-type (100) monocrystalline silicon wafers using two different anodization conditions. The PS samples were implanted with nitrogen by PIII and annealed at temperatures between 100 and 1000 degreesC. Photoluminescence (PL) and reflectance measurements on the implanted samples for wavelengths between 220 and 800 nm were carried out before and after annealing. Two peaks of PL intensity in the visible region. (640 and 730 nm) were observed. Increasing the annealing temperature reduced the PL intensity and changed the relative intensity between the peaks. A reduction in the ultraviolet reflectance was observed for polished implanted Si samples and for both types of implanted PS samples before annealing. After annealing, the reflectance decreased in the UV region up to 600 degreesC. Above 800 degreesC, there was an increase in reflectance, indicating occurrence of recrystallization |
| Area | FISMAT |
| Arrangement 1 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Photoluminescence and reflectance... |
| Arrangement 2 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Photoluminescence and reflectance... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | AFBeloto_Article_NucInstrumMethodsPhysResB2003.pdf |
| User Group | administrator |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ESR3H2 8JMKD3MGPCW/3ET2RFS |
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
| Host Collection | sid.inpe.br/banon/2001/04.03.15.36 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes number orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
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