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1. Identity statement
Reference TypeJournal Article
Sitemarte3.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZsFDuKxG/zagv4
Repositorysid.inpe.br/marciana/2003/08.15.15.47   (restricted access)
Last Update2006:03.07.13.18.00 (UTC) administrator
Metadata Repositorysid.inpe.br/marciana/2003/08.15.15.47.50
Metadata Last Update2018:06.06.03.57.15 (UTC) administrator
Secondary KeyINPE-9886-PRE/5459
ISSN0168-583X
0167-5087
Citation KeyUedaTaDaRoCaTa:2003:AlPlIm
TitleAluminum plasma immersion ion implantation in polymers
Year2003
MonthMay
Access Date2024, Apr. 28
Secondary TypePRE PI
Number of Files1
Size188 KiB
2. Context
Author1 Ueda, Mário
2 Tan, Ing Hwie
3 Dallaqua, Renato Sérgio
4 Rossi, José Oswaldo
5 Castro, Joaquim José Barroso de
6 Tabacniks, M. H.
Group1 LAP-INPE-MCT-BR
Affiliation1 Inst Nacl Pesquisas Espaciais, Lab Assoc Plasmas, BR-12227010 Sao Jose Dos Campos, SP, Brazil
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume206
Pages760-766
History (UTC)2006-03-07 13:18:20 :: marciana -> administrator ::
2018-06-06 03:57:15 :: administrator -> marciana :: 2003
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Keywordsplasma immersion ion implantation
polymers
oxidation
vacuum arcs
AbstractAtomic oxygen (AO) degradation of polymer-based materials is a serious concern in long life satellites or space stations orbiting low Earth orbit environment. Protection against AO can be achieved by a thin metal oxide layer on the polymer's surface. Metal implantation followed by oxidation is a promising way of creating this layer with superior adhesion to the substrate. This work reports on the implantation of Kapton, Mylar, polypropylene and polyethylene samples with aluminum ions at 2.5, 5 and 7 kV, by plasma immersion in a vacuum arc plasma with a straight magnetic filter. With samples oriented with surfaces parallel to the plasma stream SEM and EDS analysis showed no macro-particle contamination and no significant changes in morphology after implantation. Rutherford backscattering spectroscopy showed retained doses of (1-3) x 10(16) cm(-2), with most of the aluminum concentrated on the surface. This is probably due to deposition of aluminum between high voltage pulses, and reduction in the sample's surface voltage due to surface charging.
AreaFISPLASMA
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Aluminum plasma immersion...
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4. Conditions of access and use
Languageen
Target File58.pdf
User Groupadministrator
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES; COMPENDEX.
Host Collectionsid.inpe.br/banon/2001/04.03.15.36
6. Notes
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