| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | marte3.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZsFDuKxG/zagBM |
| Repository | sid.inpe.br/marciana/2003/08.15.15.53 (restricted access) |
| Last Update | 2006:02.16.16.13.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/marciana/2003/08.15.15.53.23 |
| Metadata Last Update | 2018:06.06.03.57.15 (UTC) administrator |
| Secondary Key | INPE-9887-PRE/5460 |
| ISSN | 0257-8972 |
| Citation Key | TanUeDaRoBeAb:2003:MaPlIm |
| Title | Magnesium plasma immersion ion implantation on silicon wafers  |
| Project | Implantação iônica por imersão em plasma (IIIP) |
| Year | 2003 |
| Month | June |
| Access Date | 2024, Apr. 27 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 697 KiB |
| 2. Context | |
| Author | 1 Tan, Ing Hwie 2 Ueda, Mário 3 Dallaqua, Renato Sérgio 4 Rossi, José Oswaldo 5 Beloto, Antonio Fernando 6 Abramof, Eduardo |
| Group | 1 LAP-INPE-MCT-BR 2 LAP-INPE-MCT-BR 3 LAP-INPE-MCT-BR 4 LAP-INPE-MCT-BR 5 LAS-INPE-MCT-BR 6 LAS-INPE-MCT-BR |
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 2 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 3 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 4 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 5 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Mateiria e Sensores (INPE.LAS) 6 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Mateiria e Sensores (INPE.LAS) |
| Journal | Surface and Coatings Technology |
| Volume | 169 |
| Pages | 379-383 |
| History (UTC) | 2006-02-16 16:13:28 :: marciana -> administrator :: 2007-05-15 13:48:50 :: administrator -> marciana :: 2008-01-14 15:34:17 :: marciana -> administrator :: 2018-06-06 03:57:15 :: administrator -> marciana :: 2003 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | PLASMA Metal plasma immersion ion implantation Metal oxides Macroparticle filtering Vacuum arcs Vacuum-arc plasma Silicon PLASMA Implantação iônica por imersão em plasma metalico Óxidos metálicos Filtro de micropartículas Vácuo Silicone |
| Abstract | Magnesium ions were implanted by plasma immersion ion implantation on Si wafers. The vacuum arc plasma gun has a straight configuration. and samples were biased from - 2 to - 8 kV with 20-mus pulses at 700 Hz, with or without a magnetic field of 150 G, with arc currents of 600 A. Three samples were positioned 85 cm away from the anode grid, one sample with its surface facing the plasma stream and perpendicular to B (frontal samples), while the others have surfaces parallel to the plasma stream and the magnetic field (lateral samples). High-resolution X-ray diffraction results showed that implantation occurred, as evidenced by distortion of the rocking curves obtained. Deposition with thickness of the order of 1 mum also occurred, but was considerably thinner for samples positioned parallel to the plasma stream. Lateral samples are also free of macroparticles, as shown by SEM observations. The presence of a magnetic field significantly increases the implanted current and the deposition thickness in frontal samples. since plasma density is increased by two orders of magnitude. |
| Area | FISPLASMA |
| Arrangement 1 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Magnesium plasma immersion... |
| Arrangement 2 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Magnesium plasma immersion... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | 61.pdf |
| User Group | administrator marciana |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ESR3H2 8JMKD3MGPCW/3ET2RFS |
| Dissemination | WEBSCI; PORTALCAPES. |
| Host Collection | sid.inpe.br/banon/2001/04.03.15.36 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes number orcid parameterlist parentrepositories previousedition previouslowerunit progress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |