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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZsFDuKxG/Fmjs3
Repositorysid.inpe.br/marciana/2005/03.04.15.47   (restricted access)
Last Update2005:03.04.03.00.00 (UTC) administrator
Metadata Repositorysid.inpe.br/marciana/2005/03.04.15.47.12
Metadata Last Update2018:06.05.01.21.34 (UTC) administrator
Secondary KeyINPE-12254-PRE/7584
ISSN0022-0248
Citation KeyFernandezASLSTACPAPAFSL:2001:ElReBa
TitleElectrical resistivity and band-gap shift of Si-doped GaN and metal-nonmetal transition in cubic GaN, InN and AlN systems
Year2001
MonthOct.
Access Date2024, Apr. 27
Secondary TypePRE PI
Number of Files1
Size223 KiB
2. Context
Author 1 Fernandez, J. R. L.
 2 Araújo, C. Moysés
 3 Silva, Antonio Ferreira da
 4 Leite, J. R.
 5 Sernelius, E.
 6 Tabata, A.
 7 Abramof, Eduardo
 8 Chitta, V. A.
 9 Persson, C.
10 Ahuja, R.
11 Pepe, I.
12 As, D. J.
13 Frey, T.
14 Schikora, D.
15 Lischka, K.
Resume Identifier 1
 2
 3 8JMKD3MGP5W/3C9JGJC
 4
 5
 6
 7 8JMKD3MGP5W/3C9JGUH
Group 1 LAS-INPE-MCT-BR
Affiliation 1 Universidade de São Paulo Instituto de Física, São Paulo, SP, Brazil
 2 Universidade Federal da Bahia. Instituto de Física, Salvador, Bahia, Brazil
 3 Department of Physics and Measurement Technology, Linköping University, SE-581 83 Linköping, Sweden
 4 Instituto Nacional de Pesquisas Espaciais (INPE-LAS), São José dos Campos, SP, Brazil
 5 Department of Physics, Uppsala University, SE-751 21 Uppsala, Sweden
 6 Universität Paderborn, FB-6 Physik, D-33095 Paderborn, Germany
JournalJournal of Crystal Growth
Volume231
Number3
Pages420-427
History (UTC)2006-01-23 12:36:07 :: sergio -> administrator ::
2006-09-28 22:26:07 :: administrator -> sergio ::
2008-01-07 12:54:01 :: sergio -> administrator ::
2018-06-05 01:21:34 :: administrator -> marciana :: 2001
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsA1. Characterization
A1. Doping
A3. Molecular beam epitaxy
B1. Nitrides
AbstractThe critical impurity concentration Nc of the metalnonmetal (MNM) transition for the cubic GaN, InN and AlN systems, is calculated using the following two different criteria: vanishing of the donor binding energy and the crossing point between the energies in the metallic and insulating phases. A dielectric function model with a LorentzLorenz correction is used for the insulating phase. The InN presents an order of magnitude increase in Nc as compared to the other two systems. The electrical resistivity of the Si-donor system GaN is investigated theoretically and experimentally from room temperature down to 10 K. It presents a metallic character above a certain high impurity concentration identified as Nc: The samples were grown by plasma assisted molecular beam epitaxy (MBE) on GaAs (0 0 1) substrate. The model calculation is carried out from a recently proposed generalized Drude approach (GDA) presenting a very good estimation for the metallic region. The band-gap shift (BGS) of Si-doped GaN has also been investigated above the MNM transition where this shift is observed. Theoretical and experimental results have a rough agreement in a range of impurity concentration of interest. r 2001 Elsevier Science B.V All rights reserve.
AreaFISMAT
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Electrical resistivity and...
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4. Conditions of access and use
Languageen
Target Fileelectrical resistivity.pdf
User Groupadministrator
sergio
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
DisseminationWEBSCI; PORTALCAPES.
Host Collectionsid.inpe.br/banon/2003/08.15.17.40
6. Notes
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