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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZGivnJVY/LwsuR
Repositorysid.inpe.br/mtc-m16@80/2006/06.21.18.37   (restricted access)
Last Update2006:06.21.18.37.10 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m16@80/2006/06.21.18.37.11
Metadata Last Update2018:06.05.01.16.51 (UTC) administrator
Secondary KeyINPE-13800--PRE/8986
ISSN0168-583X
0167-5087
Citation KeyRossiTanUeda:2006:PlImUs
TitlePlasma implantation using high-energy ions and short high voltage pulses
Year2006
MonthJan.
Access Date2024, Apr. 28
Secondary TypePRE PI
Number of Files1
Size179 KiB
2. Context
Author1 Rossi, José Oswaldo
2 Tan, Ing Hwie
3 Ueda, Mário
Resume Identifier1
2 8JMKD3MGP5W/3C9JHDC
3 8JMKD3MGP5W/3C9JHSB
Group1 LAP-INPE-MCT-BR
2 LAP-INPE-MCT-BR
3 LAP-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP)
2 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP)
3 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP)
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume242
Number1/2
Pages328-331
History (UTC)2006-06-21 18:37:11 :: simone -> administrator ::
2018-06-05 01:16:51 :: administrator -> marciana :: 2006
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Keywordsplasma implantation
Blumlein line
short pulses
high voltage
pulse generator
nitrided surfaces
AbstractThe main objective of this paper is to describe the use of a high voltage pulser based on Blumlein technology for surface treatment by plasma immersion implantation. In particular, we will consider its potential application for nitriding polymer and Al surfaces. The Blumlein technique consists basically of charging several coaxial transmission in parallel and discharging them in series into a matched load by means of the closure of a thyratron switch at the generator input side.
AreaFISPLASMA
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma implantation using...
doc Directory Contentaccess
source Directory Contentthere are no files
agreement Directory Contentthere are no files
4. Conditions of access and use
Languageen
Target FilePlasma implantation using high energy ions.pdf
User Groupadministrator
simone
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
Update Permissiontransferred to simone
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES; COMPENDEX.
Host Collectionsid.inpe.br/banon/2003/08.15.17.40
6. Notes
Empty Fieldsalternatejournal archivist callnumber copyright creatorhistory descriptionlevel doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Description control
e-Mail (login)marciana
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