1. Identity statement | |
Reference Type | Journal Article |
Site | mtc-m16b.sid.inpe.br |
Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
Identifier | 6qtX3pFwXQZGivnK2Y/NnmPt |
Repository | sid.inpe.br/mtc-m17@80/2006/12.05.17.37 (restricted access) |
Last Update | 2007:06.28.15.10.44 (UTC) administrator |
Metadata Repository | sid.inpe.br/mtc-m17@80/2006/12.05.17.37.16 |
Metadata Last Update | 2018:06.05.03.33.56 (UTC) administrator |
Secondary Key | INPE-14763-PRE/9734 |
ISSN | 0257-8972 |
Citation Key | TanUedOliDalReu:2007:PlImIo |
Title | Plasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fields |
Year | 2007 |
Month | Feb. |
Access Date | 2024, Apr. 27 |
Secondary Type | PRE PI |
Number of Files | 1 |
Size | 400 KiB |
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2. Context | |
Author | 1 Tan, Ing Hwie 2 Ueda, M¨¢rio 3 Oliveira, Rogerio Moares de 4 Dallaqua, Renato S¨¦rgio 5 Reuther, H. |
Resume Identifier | 1 8JMKD3MGP5W/3C9JHDC |
Group | 1 LAP-INPE-MCT-BR 2 LAP-INPE-MCT-BR 3 LAP-INPE-MCT-BR 4 LAP-INPE-MCT-BR |
Affiliation | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 Instituto Nacional de Pesquisas Espaciais (INPE) 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 Instituto Nacional de Pesquisas Espaciais (INPE) 5 Research Center Rossendorf, Institute of Ion Beam Physics and Materials Research |
Journal | Surface and Coatings Technology |
Volume | 201 |
Number | 9/11 |
Pages | 4826-4831 |
History (UTC) | 2007-12-19 15:44:34 :: simone -> administrator :: 2012-11-24 01:39:31 :: administrator -> simone :: 2007 2013-02-20 15:19:54 :: simone -> administrator :: 2007 2018-06-05 03:33:56 :: administrator -> marciana :: 2007 |
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3. Content and structure | |
Is the master or a copy? | is the master |
Content Stage | completed |
Transferable | 1 |
Content Type | External Contribution |
Keywords | Plasma immersion ion implantation (PIII) Vacuum arc Magnetic suppression Double probes |
Abstract | The influence of low magnetic fields (B ¡Ü 130 G) on the plasma parameters of a DC nitrogen glow discharge is investigated with a double Langmuir probe. The discharge was optimized for maximum plasma density for different values of a magnetic field, and a condition was found in which density was enhanced by an order of magnitude. In this condition partial suppression of secondary electron emission was obtained during ion implantation experiments. Silicon samples implanted in this optimum density condition showed larger retained dose and penetration depth compared with samples treated in non-magnetized plasmas as shown by Auger electron spectroscopy depth profile analysis. These results were compared with previous similar experiments in much denser magnetized vacuum arc plasmas, in which total suppression of secondary electrons (SE) was obtained, corroborating the theory that the maintenance of a virtual cathode for SE suppression is favored by higher plasma density. Silicon samples implanted in magnetized magnesium plasmas exhibited much larger doses (as expected) and penetration depths (not so obvious) than the ones treated in non-magnetized plasmas. The deeper ion penetration obtained in magnetized gaseous and vacuum arc plasmas indicates that an enhanced diffusion may be taking place induced by the large ion bombardment in dense plasmas. |
Area | FISPLASMA |
Arrangement | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma immersion ion... |
doc Directory Content | access |
source Directory Content | there are no files |
agreement Directory Content | there are no files |
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4. Conditions of access and use | |
Language | en |
Target File | plasma immersion.pdf |
User Group | administrator simone |
Visibility | shown |
Copy Holder | SID/SCD |
Archiving Policy | denypublisher denyfinaldraft24 |
Read Permission | deny from all and allow from 150.163 |
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5. Allied materials | |
Next Higher Units | 8JMKD3MGPCW/3ET2RFS |
Dissemination | WEBSCI; PORTALCAPES. |
Host Collection | lcp.inpe.br/ignes/2004/02.12.18.39 cptec.inpe.br/walmeida/2003/04.25.17.12 |
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6. Notes | |
Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
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7. Description control | |
e-Mail (login) | marciana |
update | |
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