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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16b.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZGivnK2Y/NnmPt
Repositorysid.inpe.br/mtc-m17@80/2006/12.05.17.37   (restricted access)
Last Update2007:06.28.15.10.44 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m17@80/2006/12.05.17.37.16
Metadata Last Update2018:06.05.03.33.56 (UTC) administrator
Secondary KeyINPE-14763-PRE/9734
ISSN0257-8972
Citation KeyTanUedOliDalReu:2007:PlImIo
TitlePlasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fields
Year2007
MonthFeb.
Access Date2024, Apr. 27
Secondary TypePRE PI
Number of Files1
Size400 KiB
2. Context
Author1 Tan, Ing Hwie
2 Ueda, M¨¢rio
3 Oliveira, Rogerio Moares de
4 Dallaqua, Renato S¨¦rgio
5 Reuther, H.
Resume Identifier1 8JMKD3MGP5W/3C9JHDC
Group1 LAP-INPE-MCT-BR
2 LAP-INPE-MCT-BR
3 LAP-INPE-MCT-BR
4 LAP-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Research Center Rossendorf, Institute of Ion Beam Physics and Materials Research
JournalSurface and Coatings Technology
Volume201
Number9/11
Pages4826-4831
History (UTC)2007-12-19 15:44:34 :: simone -> administrator ::
2012-11-24 01:39:31 :: administrator -> simone :: 2007
2013-02-20 15:19:54 :: simone -> administrator :: 2007
2018-06-05 03:33:56 :: administrator -> marciana :: 2007
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsPlasma immersion ion implantation (PIII)
Vacuum arc
Magnetic suppression
Double probes
AbstractThe influence of low magnetic fields (B ¡Ü 130 G) on the plasma parameters of a DC nitrogen glow discharge is investigated with a double Langmuir probe. The discharge was optimized for maximum plasma density for different values of a magnetic field, and a condition was found in which density was enhanced by an order of magnitude. In this condition partial suppression of secondary electron emission was obtained during ion implantation experiments. Silicon samples implanted in this optimum density condition showed larger retained dose and penetration depth compared with samples treated in non-magnetized plasmas as shown by Auger electron spectroscopy depth profile analysis. These results were compared with previous similar experiments in much denser magnetized vacuum arc plasmas, in which total suppression of secondary electrons (SE) was obtained, corroborating the theory that the maintenance of a virtual cathode for SE suppression is favored by higher plasma density. Silicon samples implanted in magnetized magnesium plasmas exhibited much larger doses (as expected) and penetration depths (not so obvious) than the ones treated in non-magnetized plasmas. The deeper ion penetration obtained in magnetized gaseous and vacuum arc plasmas indicates that an enhanced diffusion may be taking place induced by the large ion bombardment in dense plasmas.
AreaFISPLASMA
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma immersion ion...
doc Directory Contentaccess
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4. Conditions of access and use
Languageen
Target Fileplasma immersion.pdf
User Groupadministrator
simone
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES.
Host Collectionlcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notes
Empty Fieldsalternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Description control
e-Mail (login)marciana
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