1. Identity statement | |
Reference Type | Journal Article |
Site | mtc-m16b.sid.inpe.br |
Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
Identifier | 6qtX3pFwXQZGivnK2Y/NnMP3 |
Repository | sid.inpe.br/mtc-m17@80/2006/12.06.13.07 (restricted access) |
Last Update | 2006:12.06.13.07.39 (UTC) administrator |
Metadata Repository | sid.inpe.br/mtc-m17@80/2006/12.06.13.07.40 |
Metadata Last Update | 2018:06.05.03.44.17 (UTC) administrator |
Secondary Key | INPE-14414-PRE/9498 |
ISSN | 0169-4332 |
Citation Key | ChiaramonteAbrFabCar:2006:XrMuDi |
Title | X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(0 0 1) |
Year | 2006 |
Month | Nov. |
Access Date | 2024, Apr. 28 |
Secondary Type | PRE PI |
Number of Files | 1 |
Size | 321 KiB |
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2. Context | |
Author | 1 Chiaramonte, T. 2 Abramof, Eduardo 3 Fabreguette, F. 4 Sacilotti 5 Cardoso, L. P. |
Resume Identifier | 1 2 8JMKD3MGP5W/3C9JGUH |
Group | 1 2 LAS-INPE-MCT-BR |
Affiliation | 1 IFGW, UNICAMP 2 Instituto Nacional de Pesquisas Espaciais (INPE) 3 Thin Films and Nanostructure Group, Universite de Bourgogne 4 Thin Films and Nanostructure Group, Universite de Bourgogne 5 Thin Films and Nanostructure Group, Universite de Bourgogne |
Journal | Applied Surface Science |
Volume | 253 |
Number | 3 |
Pages | 1590-1594 |
History (UTC) | 2006-12-06 13:07:40 :: simone -> administrator :: 2012-11-24 01:39:32 :: administrator -> simone :: 2006 2013-02-20 15:19:54 :: simone -> administrator :: 2006 2018-06-05 03:44:17 :: administrator -> marciana :: 2006 |
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3. Content and structure | |
Is the master or a copy? | is the master |
Content Stage | completed |
Transferable | 1 |
Content Type | External Contribution |
Keywords | TiO2 TiNO MOCVD Thin film X-ray multiple diffraction Renninger scan |
Abstract | TiO2 and TiNxOy thin films grown by low pressure metal-organic chemical vapor deposition (LP-MOCVD) on top of Si(0 0 1) substrate were characterized by X-ray multiple diffraction. X-ray reflectivity analysis of TiO2[1 1 0] and TiNO[1 0 0] polycrystalline layers allowed to determine the growth rate (−80 Å/min) of TiO2 and (−40 Å/min) of TiNO films. X-ray multiple diffraction through the Renninger scans, i.e., -scans for (0 0 2)Si substrate primary reflection is used as a non-conventional method to obtain the substrate lattice parameter distortion due to the thin film conventional deposition, from where the information on film strain type is obtained. |
Area | FISMAT |
Arrangement | X-ray multiple diffraction... |
doc Directory Content | access |
source Directory Content | there are no files |
agreement Directory Content | there are no files |
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4. Conditions of access and use | |
Language | en |
Target File | X ray multiple difrraction.pdf |
User Group | administrator simone |
Visibility | shown |
Copy Holder | SID/SCD |
Archiving Policy | denypublisher denyfinaldraft24 |
Read Permission | deny from all and allow from 150.163 |
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5. Allied materials | |
Next Higher Units | 8JMKD3MGPCW/3ESR3H2 |
Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
Host Collection | lcp.inpe.br/ignes/2004/02.12.18.39 cptec.inpe.br/walmeida/2003/04.25.17.12 |
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6. Notes | |
Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
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7. Description control | |
e-Mail (login) | marciana |
update | |
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