Close

1. Identity statement
Reference TypeJournal Article
Sitemtc-m16b.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZGivnK2Y/NnMP3
Repositorysid.inpe.br/mtc-m17@80/2006/12.06.13.07   (restricted access)
Last Update2006:12.06.13.07.39 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m17@80/2006/12.06.13.07.40
Metadata Last Update2018:06.05.03.44.17 (UTC) administrator
Secondary KeyINPE-14414-PRE/9498
ISSN0169-4332
Citation KeyChiaramonteAbrFabCar:2006:XrMuDi
TitleX-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(0 0 1)
Year2006
MonthNov.
Access Date2024, Apr. 28
Secondary TypePRE PI
Number of Files1
Size321 KiB
2. Context
Author1 Chiaramonte, T.
2 Abramof, Eduardo
3 Fabreguette, F.
4 Sacilotti
5 Cardoso, L. P.
Resume Identifier1
2 8JMKD3MGP5W/3C9JGUH
Group1
2 LAS-INPE-MCT-BR
Affiliation1 IFGW, UNICAMP
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Thin Films and Nanostructure Group, Universite de Bourgogne
4 Thin Films and Nanostructure Group, Universite de Bourgogne
5 Thin Films and Nanostructure Group, Universite de Bourgogne
JournalApplied Surface Science
Volume253
Number3
Pages1590-1594
History (UTC)2006-12-06 13:07:40 :: simone -> administrator ::
2012-11-24 01:39:32 :: administrator -> simone :: 2006
2013-02-20 15:19:54 :: simone -> administrator :: 2006
2018-06-05 03:44:17 :: administrator -> marciana :: 2006
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsTiO2
TiNO
MOCVD
Thin film
X-ray multiple diffraction
Renninger scan
AbstractTiO2 and TiNxOy thin films grown by low pressure metal-organic chemical vapor deposition (LP-MOCVD) on top of Si(0 0 1) substrate were characterized by X-ray multiple diffraction. X-ray reflectivity analysis of TiO2[1 1 0] and TiNO[1 0 0] polycrystalline layers allowed to determine the growth rate (−80 Å/min) of TiO2 and (−40 Å/min) of TiNO films. X-ray multiple diffraction through the Renninger scans, i.e., -scans for (0 0 2)Si substrate primary reflection is used as a non-conventional method to obtain the substrate lattice parameter distortion due to the thin film conventional deposition, from where the information on film strain type is obtained.
AreaFISMAT
ArrangementX-ray multiple diffraction...
doc Directory Contentaccess
source Directory Contentthere are no files
agreement Directory Contentthere are no files
4. Conditions of access and use
Languageen
Target FileX ray multiple difrraction.pdf
User Groupadministrator
simone
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
DisseminationWEBSCI; PORTALCAPES; COMPENDEX.
Host Collectionlcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notes
Empty Fieldsalternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Description control
e-Mail (login)marciana
update 


Close