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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16b.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZGivnK2Y/Nop3u
Repositorysid.inpe.br/mtc-m17@80/2006/12.07.12.39   (restricted access)
Last Update2007:06.15.16.59.12 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m17@80/2006/12.07.12.39.44
Metadata Last Update2018:06.05.03.33.56 (UTC) administrator
Secondary KeyINPE-14707-PRE/9678
ISSN0257-8972
Citation KeyUedaTanDallRoss:2007:SeElSu
TitleSecondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field
Year2007
MonthApr
Access Date2024, Apr. 28
Secondary TypePRE PI
Number of Files1
Size270 KiB
2. Context
Author1 Ueda, Mário
2 Tan, Ing Hwie
3 Dallaqua, Renato Sérgio
4 Rossi, José Oswaldo
Resume Identifier1
2 8JMKD3MGP5W/3C9JHDC
Group1 LAP-INPE-MCT-BR
2 LAP-INPE-MCT-BR
3 LAP-INPE-MCT-BR
4 LAP-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
JournalSurface and Coatings Technology
Volume201
Number15
Pages6597-6600
History (UTC)2007-06-15 16:59:12 :: simone -> administrator ::
2012-11-24 01:39:41 :: administrator -> simone :: 2007
2013-02-20 15:19:55 :: simone -> administrator :: 2007
2018-06-05 03:33:56 :: administrator -> marciana :: 2007
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsPlasma immersion ion implantation
Secondary electrons
Magnetic suppression
AbstractExperiments aiming at the reduction or even total suppression of secondary electrons during the plasma immersion ion implantation were carried out using a plasma device with low DC magnetic field. Comparison of ion implantations in B = 0 and another case with B = 43 G, indicated that the magnetic field was effective to suppress SE flow in the direction transversal to B but only partial suppression was attained in the longitudinal direction. However, these results are already significant since the efficiency of implantation was increased and the flow of SE to the walls became localized to the regions with B crossing the walls.
AreaFISPLASMA
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Secondary electron suppression...
doc Directory Contentaccess
source Directory Contentthere are no files
agreement Directory Contentthere are no files
4. Conditions of access and use
Languageen
Target Filesecondary electron.pdf
User Groupadministrator
simone
Visibilityshown
Copy HolderSID/SCD
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES.
Host Collectionlcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notes
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7. Description control
e-Mail (login)marciana
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