| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | mtc-m16b.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZGivnK2Y/Nvkgh |
| Repository | sid.inpe.br/mtc-m17@80/2006/12.19.11.12 (restricted access) |
| Last Update | 2006:12.19.11.12.40 (UTC) administrator |
| Metadata Repository | sid.inpe.br/mtc-m17@80/2006/12.19.11.12.42 |
| Metadata Last Update | 2018:06.05.03.44.42 (UTC) administrator |
| Secondary Key | INPE--PRE/ |
| ISSN | 0925-9635 |
| Citation Key | RodriguesJaMiLeViFr:2006:DeHaAm |
| Title | Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas  |
| Year | 2006 |
| Access Date | 2024, Apr. 27 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 418 KiB |
| 2. Context | |
| Author | 1 Rodrigues, Gil Capote 2 Jacobsohn, L. G. 3 Michel, M. D. 4 Lepienski, C. M. 5 Vieira, A. L. 6 Franceschini, D. F. |
| Group | 1 LAS-INPE-MCT-BR |
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 Materials Science & Technology Division, Los Alamos National Laboratory 3 Departamento de Física, Universidade Federal do Paraná 4 Departamento de Física, Universidade Federal do Paraná 5 Instituto de Física, Universidade Federal Fluminense 6 Instituto de Física, Universidade Federal Fluminense |
| Journal | Diamond and Related Materials |
| Volume | In press |
| History (UTC) | 2006-12-19 11:12:42 :: simone -> administrator :: 2010-05-11 02:48:21 :: administrator -> simone :: 2011-05-29 09:30:09 :: simone -> administrator :: 2012-11-24 01:39:54 :: administrator -> simone :: 2006 2013-02-20 15:19:56 :: simone -> administrator :: 2006 2018-06-05 03:44:42 :: administrator -> marciana :: 2006 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | Hollow-cathode Plasma deposition Amorphous hydrogenated carbon Mechanical properties |
| Abstract | Hard amorphous hydrogenated carbon (a-C:H) films were deposited by plasma decomposition of CH4 gas in a RF parallel-plate hollow-cathode system. The deposition system was built by placing a metallic plate in parallel to and in electrical contact with an usual RF-PECVD planar cathode. Self-bias versus RF power curves were used to make an initial characterization of plasma discharges in nitrogen gas atmospheres, for pressures between 10 and 100 mTorr. The strongly increased power consumption to obtain the same self-bias in the hollow-cathode system evidenced an increase in plasma density. The a-C:H films were deposited onto Si single crystalline substrates, in the − 50 to − 500 V self-bias range, at 5, 10 and 50 mTorr deposition pressures. The film deposition rate was found to be about four times than that usually observed for single-cathode RF-PECVD-deposited films, under methane atmosphere, at similar pressure and self-bias conditions. Characterization of film structure was carried out by Raman spectroscopy on films deposited at 10 and 50 mTorr pressures. Gaussian deconvolution of the Raman spectra in its D and G bands shows a continuous increase in the ID/IG integrated band intensity ratio upon self-bias increase, obeying the expected increasing behavior of the sp2 carbon atom fraction. The peak position of the G band was found to increase up to − 300 V self-bias, showing a nearly constant behavior for higher self-bias absolute values. On the other hand, the G band width showed a nearly constant behavior within the entire self-bias range. Nanohardness measurements have shown that films deposited with self-bias greater than 300 V are as hard as films obtained by the usual PECVD techniques, showing a maximum hardness of about 18 GPa. Films were also found to develop high internal compressive stress. The stress dependence on self-bias showed a strong maximum at about − 200 V self-bias, with a maximum stress value of about 5 GPa. |
| Area | FISMAT |
| Arrangement | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Deposition of hard... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | Deposition of hard.pdf |
| User Group | administrator simone |
| Visibility | shown |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ESR3H2 |
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
| Host Collection | lcp.inpe.br/ignes/2004/02.12.18.39 cptec.inpe.br/walmeida/2003/04.25.17.12 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository month nextedition notes number orcid pages parameterlist parentrepositories previousedition previouslowerunit progress project readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |