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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16b.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier6qtX3pFwXQZGivnK2Y/SnH9H
Repositorysid.inpe.br/mtc-m17@80/2007/12.06.16.38   (restricted access)
Last Update2008:06.24.17.44.42 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m17@80/2007/12.06.16.38.43
Metadata Last Update2018:06.05.03.30.28 (UTC) administrator
Secondary KeyINPE--PRE/
DOI10.1016/j.tsf.2007.08.007
ISSN0040-6090
Citation KeyCapoteBonSanTraCor:2008:AdAmHy
TitleAdherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition
Year2008
MonthApr.
Access Date2024, Apr. 27
Secondary TypePRE PI
Number of Files1
Size621 KiB
2. Context
Author1 Capote, Gil
2 Bonetti, L. F.
3 Santos, L. V.
4 Trava-Airoldi, Vladimir Jesus
5 Corat, Evaldo José
Group1 LAS-CTE-INPE-MCT-BR
2 LAS-CTE-INPE-MCT-BR
3 LAS-CTE-INPE-MCT-BR
4 LAS-CTE-INPE-MCT-BR
5 LAS-CTE-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
JournalThin Solid Films
Volume516
Number12
Pages4011-4017
History (UTC)2008-06-24 17:44:42 :: simone -> administrator ::
2012-07-13 22:26:26 :: administrator -> simone ::
2013-02-20 15:20:11 :: simone -> administrator :: 2008
2018-06-05 03:30:28 :: administrator -> marciana :: 2008
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsAmorphous hydrogenated carbon
Plasma enhanced chemical vapor deposition
Silicon interlayer
Adhesion
X-ray photoelectron spectra
Mechanical properties
AbstractThis paper reports the findings of a study of the structural, mechanical, and tribological properties of amorphous hydrogenated carbon (a-C:H) coatings for industrial applications. These thin films have proven quite advantageous in many tribological applications, but for others, thicker films are required. In this study, in order to overcome the high residual stress and low adherence of a-C:H films on metal substrates, a thin amorphous silicon interlayer was deposited as an interface. Amorphous silicon and a-C:H films were grown by using a radio frequency plasma enhanced chemical vapor deposition system at 13.56 MHz in silane and methane atmospheres, respectively. The X-ray photoelectron spectroscopy technique was employed to analyze the chemical bonding within the interfaces. The chemical composition and atomic density of the a-C:H films were determined by ion beam analysis. The film microstructure was studied by means of Raman scattering spectroscopy. The total stress was determined through the measurement of the substrate curvature, using a profilometer, while micro-indentation experiments helped determine the films' hardness. The friction coefficient and critical load were evaluated by using a tribometer. The results showed that the use of the amorphous silicon interlayer improved the a-C:H film deposition onto metal substrates, producing good adhesion, low compressive stress, and a high degree of hardness. SiC was observed in the interface between the amorphous silicon and a-C:H films. The composition, the microstructure, the mechanical and tribological properties of the films were strongly dependent on the self-bias voltages. The tests confirmed the importance of the intensity of ion bombardment during film growth on the mechanical and tribological properties of the films.
AreaFISMAT
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4. Conditions of access and use
Languageen
Target Fileadherent amorphous.pdf
User Groupadministrator
simone
Visibilityshown
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
DisseminationWEBSCI; PORTALCAPES.
Host Collectionlcp.inpe.br/ignes/2004/02.12.18.39
cptec.inpe.br/walmeida/2003/04.25.17.12
6. Notes
Empty Fieldsalternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel documentstage e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
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