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1. Identity statement
Reference TypeJournal Article
Sitemtc-m16d.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier8JMKD3MGP7W/3B25CFL
Repositorysid.inpe.br/mtc-m19/2011/12.14.11.36   (restricted access)
Last Update2011:12.29.13.49.17 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m19/2011/12.14.11.36.41
Metadata Last Update2018:06.05.04.25.08 (UTC) administrator
Secondary KeyINPE--PRE/
DOI10.1016/j.nimb.2011.04.095
ISSN0168-583X
0167-5087
Citation KeyUedaSiMeSiReOl:2011:InReOx
TitleInfluence of the residual oxygen in the plasma immersion ion implantation (PI3) processing of materials
Year2011
MonthDec.
Access Date2024, May 04
Secondary TypePRE PI
Number of Files1
Size776 KiB
2. Context
Author1 Ueda, M.
2 Silva Junior, A. R.
3 Mello, C. B.
4 Silva, G.
5 Reuther, H.
6 Oliveira, V. S.
Group1 LAP-CTE-INPE-MCT-BR
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
5
6 LAP-CTE-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Institute of Íon Beam Physics and Materials Research, Forschungzentrum Dresden-Rossendorf, Dresden, Germany
6 Instituto Nacional de Pesquisas Espaciais (INPE)
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume269
Number24
Pages3246-3250
History (UTC)2011-12-29 13:49:30 :: marciana -> administrator :: 2011
2012-07-15 03:00:28 :: administrator -> banon :: 2011
2012-09-24 17:25:53 :: banon -> administrator :: 2011
2018-06-05 04:25:08 :: administrator -> marciana :: 2011
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
KeywordsOxide layer
Plasma immersion ion implantation
Residual oxygen
Stainless steel and aluminum alloy
AbstractIn this work, we investigated the effects of the contaminants present in the vacuum chamber of the PI3 system, in particular, the residual oxygen, which results in the formation of the oxide compounds on the surface and hence is responsible for the high implantation energies required to achieve reasonably thick treated layers. We used a mass spectrometer (RGA) with a quadruple filter to verify the composition of the residual vacuum and pressure of the elements present in the chamber. Initially we found a high proportion of residual oxygen in a vacuum with a pressure of 1 × 10-3 Pa. Minimizing the residual oxygen percentage in about 80%, by efficient cleaning of the chamber walls and by improving the gas feeding process, we mitigated the formation of oxides during the PI3 process. Therefore we achieved a highly efficient PI3 processing obtaining implanted layers reaching about 50 nm, even in cases such as an aluminum alloy, where is very difficult to nitrogen implant at low energies. We performed nitrogen PI3 treatment of SS304 and Al7075 using pulses of only 3 kV and 15 × 10-6 s at 1 kHz with an operating pressure of 1 Pa.
AreaFISPLASMA
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4. Conditions of access and use
Languageen
User Groupadministrator
banon
marciana
Visibilityshown
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
Update Permissionnot transferred
5. Allied materials
Mirror Repositorysid.inpe.br/mtc-m19@80/2009/08.21.17.02.53
Next Higher Units8JMKD3MGPCW/3ET2RFS
DisseminationWEBSCI; PORTALCAPES.
Host Collectionsid.inpe.br/mtc-m19@80/2009/08.21.17.02
6. Notes
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7. Description control
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